UV Ultrapure Water Treatment

In the semiconductor industry, ultrapure water (UPW) with extremely low Total Organic Carbon (TOC) levels is essential to prevent defects during wafer cleaning, photolithography and rinsing processes. UVC treatment, particularly at wavelengths around 185 nm, plays a critical role in TOC reduction. At this wavelength, hydroxyl radicals are generated, which effectively oxidize organic impurities and convert them into CO₂ and H₂O. Advanced UV reactors are equipped with HOENLE UV lamps, immersion tubes and HOENLE sensors to ensure precise monitoring and stable water flow. Combined with additional purification steps such as reverse osmosis, ion exchange or electrodeionization (EDI), these systems reliably achieve TOC values below 1 ppb. This level of water purity is crucial for process stability, higher yields and reduced product rejection in semiconductor manufacturing.