Semiconductor

UV technology in the semiconductor industry – purity, precision, and process reliability

In semiconductor manufacturing, the highest standards of cleanliness, precision, and control apply. Even the smallest contamination can impair the function of complex microstructures. UV technology plays a central role here – particularly in surface treatment with excimer radiation and the disinfection of process water.

Modern UV systems perfectly combine purity, efficiency, and sustainability – a key factor for reliability and quality in high-tech semiconductor production.

Excimer UV technology ensures precise, contact-free surface cleaning and activation for wafers and substrates, improving adhesion and process stability. UV-based water disinfection provides chemical-free microbiological control, reliably eliminating bacteria, viruses, and biofilms in semiconductor production.

In semiconductor manufacturing, water purity is mission-critical. Even minimal microbial contamination can lead to defects, yield losses and process instability. Hoenle’s advanced UV water disinfection systems ensure reliable, chemical-free microbiological control in ultrapure water (UPW) and process water systems.

Using high-performance UVC radiation at 254 nm, microorganisms such as bacteria, viruses and biofilms are effectively inactivated without introducing chemicals or residues. This physical disinfection method enables consistent water quality while eliminating the need for chemical dosing and reducing operational complexity.

Hoenle UV disinfection systems are designed for seamless integration into semiconductor water loops, supporting continuous operation and stable process conditions. The result: improved process reliability, reduced contamination risk and long-term cost efficiency.

Key benefits:

• Chemical-free and residue-free disinfection
• Reliable inactivation of microorganisms
• Continuous operation for stable UPW quality
• Reduced maintenance and operating costs
• Sustainable and environmentally friendly

Total Organic Carbon (TOC) is a critical parameter in ultrapure water systems used in semiconductor manufacturing. Even trace levels of organic contamination can negatively impact wafer cleaning, photolithography and rinsing processes.

Hoenle UV technology enables highly efficient TOC reduction through photolysis at wavelengths around 185 nm. At this wavelength, high-energy UV radiation generates hydroxyl radicals, which oxidize organic contaminants and convert them into carbon dioxide (CO₂) and water (H₂O).

Integrated into advanced UPW systems, Hoenle UV reactors achieve TOC levels below 1 ppb when combined with complementary purification technologies such as reverse osmosis, ion exchange, or electrodeionization (EDI). This ensures maximum process stability and significantly reduces defect rates in semiconductor production.

Your advantage:

• Reliable TOC reduction to <1 ppb
• Improved wafer yield and process stability
• Efficient oxidation of organic contaminants
• Optimized performance in combination with UPW systems
• Proven technology for high-end semiconductor applications

UV photolysis plays a key role in advanced oxidation processes (AOP) for semiconductor water treatment. By initiating photochemical reactions, UV radiation breaks down complex organic molecules that cannot be removed by conventional filtration methods.

At 185 nm and 254 nm, UV systems generate reactive species that enable both disinfection and oxidation within a single process step. This dual functionality makes UV technology an essential component of modern ultrapure water systems, where both microbiological control and TOC reduction are required.

Hoenle systems are engineered for maximum efficiency, using optimized reactor designs, high-quality quartz components, and precise UV monitoring to ensure consistent performance under demanding semiconductor conditions.

How UV disinfection performs under real semiconductor conditions? Our case study demonstrates how Hoenle UV systems ensure reliable water quality, reduce contamination risks and support long-term process stability in demanding high-tech environments.

Do you have any questions or need support? We are happy to help you.